MKS introduces the I-Series family of high flow mass flow controllers

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In this issue: • Top semiconductor R&D leaders ranked for 2014 • Semiconductor unit shipments to exceed one trillion devices in 2017 • Techniques for simplifying pulsed measurements: Part 1 • Imec reports breakthrough results on DSA • Applied Materials unveils breakthrough e-beam metrology tool for finFET transistors and 3D NAND devices • SPIE Advanced Lithography conference concludes • Cymer announces shipment of its first XLR 700ix DUV light source and introduces DynaPulse • Directed Self Assembly Hot Topic at SPIE • Penang to host inaugural SEMICON Southeast Asia • Freescale pushes for a secure Internet of Things • AG Semiconductor Services and JA Mitsui Leasing join forces • January 2015 book-to-bill supports positive outlook for semiconductor equipment industry • MKS introduces the I-Series family of high flow mass flow controllers	Share:
Top stories Top semiconductor R&D leaders ranked for 2014Intel's R&D expenditures were 2x greater than nearest competitor; Qualcomm with largest percentage increase; Nvidia with highest R&D/sales ratio.Share:    Semiconductor unit shipments to exceed one trillion devices in 2017Updated forecast expects robust 8.2% average annual unit shipment growth through 2019.Share:    Techniques for simplifying pulsed measurements: Part 1Pulsed measurements are defined in Part 1, and common pulsed measurement challenges are discussed in Part 2.Share:    Imec reports breakthrough results on DSAAt SPIE advanced lithography conference, imec presented breakthrough results on Directed Self-Assembly (DSA) process development. Share:
Tech News Applied Materials unveils breakthrough e-beam metrology tool for finFET transistors and 3D NAND devicesAt the SPIE Advanced Lithography conference in San Jose, Calif., Applied Materials, Inc., today announced the industry's first in-line 3D CD SEM metrology tool for solving the challenges of measuring the high aspect ratio and complex features of 3D NAND and FinFET devices. Share:    SPIE Advanced Lithography conference concludesExposures, and reducing their cost, were a theme running through the 2015 SPIE Advanced Lithography Symposium this week in San Jose, Calif., the center of Silicon Valley. (From SemiMD)Share:    Cymer announces shipment of its first XLR 700ix DUV light source and introduces DynaPulseCymer, an ASML company, a developer of lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced the shipment of its first XLR 700ix light source. Share:    Directed Self Assembly Hot Topic at SPIEAt this week's SPIE Advanced Lithography Symposium in San Jose, Calif., the hottest three-letter acronym is less EUV and more DSA, as in directed self-assembly. (From SemiMD)Share:
Business News Penang to host inaugural SEMICON Southeast AsiaThe inaugural SEMICON Southeast Asia, will run from 22-24 April at the Subterranean Penang International Convention and Exhibition Centre (SPICE) in Penang, Malaysia. Share:    Freescale pushes for a secure Internet of ThingsAs the Internet of Things (IoT) continues to gain momentum, Freescale Semiconductor and its partners are tackling the most dire challenge the young movement has faced to date - the alarming lack of unified guidelines for ensuring the security of IoT applications.Share:    AG Semiconductor Services and JA Mitsui Leasing join forcesAG Semiconductor Services, LLC (AGSS), one of the largest suppliers of used electronics manufacturing equipment, is pleased to announce that it has entered into a strategic relationship with JA Mitsui Leasing, Ltd. (JAML).Share:    January 2015 book-to-bill supports positive outlook for semiconductor equipment industryA book-to-bill of 1.03 means that $103 worth of orders were received for every $100 of product billed for the month.Share:
Product News MKS introduces the I-Series family of high flow mass flow controllersMKS Instruments, Inc., a global provider of technologies that enable advanced processes and improve productivity, has introduced the I-250, I-500 and I-1000 Mass Flow Controllers. Share:
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Confederation of Indian Industry (CII)

Dear Sir/Madam,

AICTE – CII Survey of Industry-Linked Technical Institutes 2015

AICTE announces the 4th edition of survey on industry–academia collaboration in technical institutes being conducted in partnership with Confederation of Indian Industry (CII) since 2012. This survey has been successfully mapping the industry linkages of Indian technical institutes across four streams—Engineering, Management, Pharmacy and Architecture / Planning.

We request Indian institutes offering full time degree / diploma courses in the covered fields to participate in the survey to showcase the best practices for industry linkages and highlight the strengths and weaknesses of the technical education ecosystem in India. A brief information about the survey and the national advertisement announcing its launch is attached for your perusal. The list of courses under the covered fields is also enclosed.

To apply, kindly log on to the AICTE Web portal (http://www.aicte-india.org/prmportal_enu) using your AICTE’s login credentials and click on CII Questionnaire—the online application form.

A detailed help manual is available on the given link (http://www.aicte-india.org/ciisurvey.php) to provide step-by-step assistance. This Help Manual can be downloaded for easy understanding and reference. It is advised that institutes first download the Help Manual and collect all the data related to all streams.

Filing of Application: 1^st Jan 2015 – 30^th Apr 2015

Visits to Institutes: July – August 2015

Announcement of the Result: October, Knowledgexpo 2015

For any further information or query, kindly reach us at +91-11-45772003/2038.

Thanks & Regards,

Karnika

-----------------------

Karnika Bansal

Confederation of Indian Industry (CII)

3rd Floor, 28 Institutional Area

IGSSS Building, Lodi Road, New Delhi -110003

Phone: +91-11-45772003

Email: karnika.bansal@cii.in

Web: www.cii-uic.in www.cii.in

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